发明名称 ELECTRONIC DEVICE MANUFACTURING PROCESS
摘要 PROBLEM TO BE SOLVED: To manufacture a structure having smaller feature size than heretofore by adopting digital lithography. SOLUTION: The structure is formed on a substrate by a process comprising a 1st step of depositing a phase change material on the substrate, a 2nd step of forming a feature of a target material by depositing the target material at least partially in a gap and a 3rd step of removing the phase change material to leave the feature of the target material on the substrate. In the 1st step, a printing system provided with a print head is used and the phase change material is deposited in a 1st printing pattern and consequently the 1st printing pattern remains after change of the phase change material from a liquid phase to a solid phase and the 1st printing pattern defines the gap. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007193344(A) 申请公布日期 2007.08.02
申请号 JP20070011715 申请日期 2007.01.22
申请人 PALO ALTO RESEARCH CENTER INC 发明人 WILLIAM S WON;LIMB SCOTT J;CHABINYC MICHAEL L;RUSSO BEVERLY;LUJAN RENE A
分类号 G02B5/20;G03F1/92 主分类号 G02B5/20
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