发明名称 SCANNING ELECTRON MICROSCOPE
摘要 PROBLEM TO BE SOLVED: To provide a scanning electron microscope which is capable of high-speed focus alignment through precise, simple, and quick automatic measurement of a charged voltage of a wafer surface in a sample chamber, where wafer surface shows different charged voltages at the outside and inside of the sample chamber. SOLUTION: An electrode plate for applying a retarding voltage disposed above a sample is divided into two portions, and the potential of each of the divided electrode plates is changed for measuring the charged voltage of the sample from a capacitance between both divided electrode plates. Based on a result of the measurement, an optical system is controlled. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007194126(A) 申请公布日期 2007.08.02
申请号 JP20060012744 申请日期 2006.01.20
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 TANII KAZUMASA;KASAI YUJI;SASADA KATSUHIRO;SEYA HIDEKAZU
分类号 H01J37/28;H01J37/21 主分类号 H01J37/28
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