发明名称 ELECTROLESS GOLD PLATING SOLUTION AND METHOD
摘要 Electroless gold plating compositions that include an adhesion enhancer compound and a reduction accelerator are provided to obtain direct electroless gold plating over a gold, nickel or nickel alloy deposit. A method of electroless gold plating on a nickel-containing substrate is also disclosed.
申请公布号 US2007175359(A1) 申请公布日期 2007.08.02
申请号 US20060566935 申请日期 2006.12.05
申请人 HWANG KILNAM 发明人 HWANG KILNAM
分类号 C23C18/44;B05D1/18;B05D5/00 主分类号 C23C18/44
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