| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a high-sensitivity photosensitive siloxane composition which suppresses pattern drooping in heat curing, has such properties as high resolution, high heat resistance and high transparency after a heat curing step, and is used for forming a planarizing film for a TFT substrate, an interlayer insulation film or a core or clad material of an optical waveguide. <P>SOLUTION: The photosensitive siloxane composition comprises (a) a polysiloxane, (b) a quinonediazide compound and (c) a solvent, wherein the polysiloxane (a) contains at least (a') a polysiloxane whose polymer after prebaking is insoluble in a 2.38 wt.% aqueous solution of tetramethylammonium hydroxide. <P>COPYRIGHT: (C)2007,JPO&INPIT |
