EXPOSURE MASK, EXPOSURE METHOD, METHOD FOR MANUFACTURING EXPOSURE MASK, THREE-DIMENSIONAL DEVICE, AND METHOD FOR MANUFACTURING THREE-DIMENSIONAL DEVICE
摘要
<P>PROBLEM TO BE SOLVED: To produce an optical device having a large area by stitch exposure with a reduced error in exposure dose on a stitch in the process of forming a three-dimensional structure by using a gray tone pattern. <P>SOLUTION: An exposure mask M to be used for an exposure device includes a unit pattern (t) where a plurality of pattern blocks each comprising a pair of a light-shielding pattern which blocks illumination light exiting from the exposure device and a transmitting pattern which transmits the illumination light are continuously disposed with the pitches of the continuous pattern blocks being constant while the ratio of the light-shielding pattern to the transmitting pattern gradually varied; and an array pattern (s) comprising the unit patterns (t) disposed in a matrix. The mask is set in such a manner that the total exposure dose on a unit pattern in the outermost circumference of the array pattern (s) after exposing a plurality of times is almost equal to the exposure dose on a unit pattern not included in the outermost circumference after single exposure. <P>COPYRIGHT: (C)2007,JPO&INPIT
