| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid immersion exposure method which can attain the improvement of throughput of an exposure process, at the same time, does not almost have a possibility that liquid may remain on an exposed substrate. <P>SOLUTION: The liquid immersion exposure method includes each of the processes of liquid immersion moving exposure, and a first and a second liquid immersion movement. In the liquid immersion moving exposure, a liquid 11 is intervened between an exposed substrate 5 and a first optical projection system 4 of an exposure system 1. While a substrate 5 is relatively moved to the optical system 4, an exposure treatment is performed to a plurality of exposure regions 10 on the substrate surface 5a. In the first liquid immersion movement, while the liquid 11 is intervened between the substrate 5 and the optical system 4 at the adjacent each exposure region 10, the substrate 5 is relatively moved to the optical system 4 without performing the exposure treatment. In the second liquid immersion movement, while the liquid 11 is intervened between the substrate 5 and the optical system 4 in a distance longer than the first liquid immersion movement, the substrate 5 is relatively moved to the optical system 4 at a speed later than the first liquid immersion movement without performing the exposure treatment. <P>COPYRIGHT: (C)2007,JPO&INPIT |
