| 摘要 |
A device for wet treating flat plate-like substrates includes a spin-chuck ( 2 ) for holding and rotating the substrate, at least one dispenser ( 3 ) for dispensing a liquid onto at least one surface (W) of the substrate, a liquid collector ( 4 ) circumferentially surrounding the spin-chuck for collecting liquid, which is spun off the substrate during rotation, with at least two collector levels (L 1 , L 2 ), for separately collecting liquids in different collectors ( 41, 42 ), a lifter (H) for moving spin-chuck ( 2 ) relative to liquid collector ( 4 ) substantially along the rotation axis (A), at least two exhaust levels (E 1 , E 2 ) for separately collecting gas from the interior ( 40 ) of the liquid collector ( 4 ) and at least one exhaust controller ( 71 ), which is associated with at least one of the at least two exhaust levels, for selectively varying gas flow conditions in at least on of the at least two exhaust levels (E 1 , E 2 ).
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