发明名称 MULTILAYER FILM REFLECTING MIRROR, AND EUV EXPOSURE DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a multilayer film reflecting mirror capable of grounding a multilayer film, and of imparting electric potential to the multilayer film without deteriorating optical performance after adjustment. <P>SOLUTION: A conductive film 12 is formed by sputtering in advance before the multilayer film 13 is formed on a substrate of the multilayer film mirror 11. The conductive film 12 extends to a portion (holding part) on the side surface of the multilayer film mirror to which a holding member 14 is fitted, to permit the conductive film 12 and the holding member 14 to make contact with each other when the holding member 14 is fitted. With this situation the multilayer film 13 becomes conductive up to the holding member 14 mediating the conductive film 12. In such a manner, the multilayer film mirror 11 is held by the holding member 14, and optical adjustment process is conducted under that situation. The conduction is ensured at all times even when the optical adjustment is completed finally, so that it is possible to ensure conduction without deteriorating the configuration of a mirror surface owing to a new contact in a final process such as mounting a conductive wire. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007194406(A) 申请公布日期 2007.08.02
申请号 JP20060011272 申请日期 2006.01.19
申请人 NIKON CORP 发明人 SHIRAISHI MASAYUKI
分类号 H01L21/027;G03F7/20;G21K1/06 主分类号 H01L21/027
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