发明名称 |
MAINTENANCE METHOD, EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE PRODUCING METHOD |
摘要 |
An exposure apparatus irradiates an exposure light beam EL in a state that a space KS, between predetermined optical elements LS1 and LS2 among a plurality of optical elements included in a projection optical system, is filled with a liquid LQ. When the exposure light beam EL is not irradiated during, for example, the maintenance or the like, the liquid LQ in the space KS is substituted by a functional fluid LK different from the liquid LQ. This makes it possible to reduce any influence exerted by the liquid LQ on the exposure apparatus.
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申请公布号 |
EP1814146(A1) |
申请公布日期 |
2007.08.01 |
申请号 |
EP20050806839 |
申请日期 |
2005.11.18 |
申请人 |
NIKON CORPORATION |
发明人 |
NAGASAKA, HIROYUKI;OKADA, TAKAYA;UEDA, MOTOI;HOSHIKA, RYUICHI |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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