APPARATUS FOR COATING OF SEMICONDUCTOR DEVICE AND METHOD FOR PROCESSING SEMICONDUCTOR DEVICE USING THE SAME

摘要

An apparatus for coating a semiconductor device and a method for processing the semiconductor device using the same are provided to prevent the damage and contamination of a semiconductor chip due to particles by forming a predetermined coating at sides of the semiconductor device as well as an upper surface using a coating agent supply unit, an auxiliary gas supply unit and a swingable nozzle. An apparatus for coating a semiconductor device includes a control unit(110) for controlling the operation of the apparatus, a coating agent supply unit(150), an auxiliary gas supply unit(160), a nozzle, and a support unit. The nozzle(170) is used for spraying simultaneously or sequentially a coating agent supplied from the coating agent supply unit and an auxiliary gas supplied from the auxiliary gas supply unit onto the semiconductor device. The nozzle is capable of being swung during the spraying process. The support unit(180) is used for loading stably the object body.