| 摘要 |
1,266,764. Photoconductive plate. RCA CORPORATION. 23 May, 1969 [27 May, 1968], No. 26467/69. Heading HlK. [Also in Division G2] A photoconductive plate comprises a layer of one or more single-crystal n-type zinc oxide wafers, the layer having a thickness of at least 10-<SP>2</SP> mm., each of the major surfaces having an area of at least 0À25 sq. cm. and means binding the layer to a conductive backing. The backing is preferably Al, Cu or stainless steel and may be coated with In, to provide good contact. A layer of solder or silver paste is used to join the backing to the layer. The major surface of the crystal is preferably parallel to the c-axis and is etched with HCl to give a smooth surface. If a plurality of single crystals are used, the space between adjacent crystals is filled in with a silicone, alkyd or epoxy resin. The wafers may be square or hexagonal. The plate does not require dark adaptation. During electrostatic charging a Schottky barrier forms on the surface of the plate and thus a high electric charge is retained on the surface. |
