| 摘要 |
<p>A high-precision exposure apparatus using a micro mirror array is provided to reduce the resolution required by a pixel by exposing a substrate using plural micro mirror arrays. A light source(10) generates light, and a beam splitter(13) splits the light generated from the light source into plural light. Plural pattern generators(70,71,72) generate pattern images independently by using light incident from each split light. An optical member collects the pattern images generated by the pattern generators. A projection lens(50) projects the pattern image composed by the optical member onto a target object. The beam splitter splits the light into three lights so that the split light has 1/3 power relative to the incident light.</p> |
