发明名称 DEVICE FOR CONTROLLING PARTICLE DISTRIBUTION IN AN EVAPORATING DROPLET USING RADIAL ELECTROOSMOTIC FLOW
摘要 An apparatus for controlling particle distribution in an evaporating droplet using radial electroosmotic flow is provided to control the quantity and the radial direction of the radial electroosmotic flow by changing the intensity of and the polarity of a voltage applied. An apparatus for controlling particle distribution in an evaporating droplet using radial electroosmotic flow includes a first electric field forming electrode, a second electric field forming electrode, and a voltage applying device. The first electric field forming electrode is formed around the droplet including particles. The second electric field forming electrode is fixed on a substrate and is arranged in a center of the droplet to be insulated from the first electric field forming electrode. The voltage applying device applies an alternating current voltage and a direct current voltage at once. The radial electroosmotic flow is formed in a direction of the center of the droplet or in a direction around the droplet according to the property of the particle.
申请公布号 KR20070078199(A) 申请公布日期 2007.07.31
申请号 KR20060008237 申请日期 2006.01.26
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, JEONG GUN;KIM, SUNG JAE
分类号 G01N27/26 主分类号 G01N27/26
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