发明名称 SYSTEM AND METHOD FOR INSPECTING PATTERNED DEVICES HAVING MICROSCOPIC CONDUCTORS
摘要 A system for inspecting a patterned apparatus having microscopic conductors and a method for the same are provided to distinguish cutting and dust defects by analyzing cut brightness sensitive of the azimuth of lighting. A system for inspecting a patterned apparatus having microscopic conductors includes a camera and a defect classifier. The camera obtains more than one image of positions as the camera displaying the candidate defect positions of a patterned substrate defining a plane and defines an optical axis. The more than one image is illuminated by an illumination from more than one light source offset from the optical axis. The illumination is offered according to more than one passage between first and second passages not mutually paralleling planes corresponding to the plane. A response of the illumination supplied according to the first illumination passage is distinguished the response of the illumination supplied according to the second illumination passage on the camera. More than one image are inputted into the defect classifier to distinguish a candidate defect caused by foreign particles of the patterned substrate from other type candidate defects.
申请公布号 KR20070078372(A) 申请公布日期 2007.07.31
申请号 KR20070004118 申请日期 2007.01.15
申请人 ORBOTECH LTD. 发明人 BEN TULILA RAPHAEL;SAPHIRER OFER;BERLADSKY EMIL;LEIZERSON ILYA
分类号 G01B11/00;G01N21/89 主分类号 G01B11/00
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