SUPPORTER AND APPARATUS FOR CLEANING SUBSTRATES WITH THE SUPPORTER, AND METHOD FOR CLEANING SUBSTRATES

摘要

A support member, a substrate cleaning apparatus with the same, and a substrate cleaning method are provided to improve the uniformity of cleaning and to enhance a cleaning efficiency by supplying uniform conditions to all wafers using a guide plate of the support member. A substrate cleaning apparatus includes a process chamber(100), a support member, and a cleaning solution supply member. The support member is used for supporting and arranging a plurality of substrates in the process chamber. The cleaning solution supply member is arranged under the support member in the process chamber to spray a cleaning solution onto the substrates. The support member is composed of support rods(220) with slots capable of inserting the substrates, a fixing part, and a guide plate. The fixing part includes a connection plate for connecting the support rods with each other and a fixing rod prolonged from the connection plate upward corresponding to a center portion of the substrate. The guide plate(260) is installed between the substrate inserted into the slot and the fixing rod at an end portion of the support rod. The width of the guide plate is larger than that of the fixing rod.