METHOD FOR MANUFACTURING DISPLAY SUBSTRATE

摘要

A manufacturing method of a display substrate is provided to prevent the excessive etching of a step portion from generating, thereby preventing the short badness from generating between a metal pattern and a pixel electrode. The first metal pattern is formed on a base substrate and includes a gate line, a storage line and a gate electrode(120) of a switching device. A gate insulating layer(130), a channel layer and a source metal layer are sequentially formed on the base substrate. The source metal layer and the channel layer are patterned so that a source line, the second metal pattern including source and drain electrode of the switching device, a channel member(142) are formed. A passivation layer(160) and a photo resist layer are formed on the second metal pattern. The photo resist layer is patterned so that the second pattern member corresponding to the gate line, source line and switching device and the second pattern member are formed. The second pattern member is formed on the storage line. The passivation layer and the gate insulation layer are etched by means of the first and second pattern members. A pixel electrode(PE) is formed by means of the first pattern member.