| 摘要 |
A METHOD FOR ALIGNING A SUBSTRATE (300) ON A LITHOGRAPHIC APPARATUS (100) INCLUDES PROVIDING A SUBSTRATE (300) HAVING A FIRST PLURALITY OF GRATING MARKS (252,256) OPIMIZED FOR A BEAM OF A FIRST GIVEN DIFFRACTION ORDER AND A SECOND PLURALITY OF GRATING MARKS (254,258) OPTIMIZED FOR A BEAM OF A SECOND GIVEN DIFFRACTION ORDER ON A LITHOGRAPHIC APPARATUS (100).A FIRST SIGNAL (302) IS GENERATED USING A FIRST BEAM REFLECTED FROM THE FIRST GRATING MARKS (252,256) , THE FIRST BEAM BEING A BEAM OF THE FIRST GIVEN DIFFRACTION ORDER.A SECOND SIGNAL (304,304’)IS GENERATED USING A SECOND BEAM REFLECTED FROM THE SECOND GRATING MARKS, THE SECOND BEAM BEING A BEAM OF THE SECOND GIVEN DIFFRACTION ORDER. THE SUBSTRATE (300) IS ALIGNED WITH RESPECT TO THE APPARATUS (100) USING THE FIRST AND SECOND SIGNALS (302,304,304’).(FIG 4A)
|
