发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME
摘要 This invention provides a semiconductor device that solves a problem that a pattern of a wiring formed on a back surface of a semiconductor substrate is reflected on an output image. A light receiving element (e.g. a CCD, an infrared ray sensor, a CMOS sensor, or an illumination sensor) is formed on a front surface of a semiconductor substrate, and a plurality of ball-shaped conductive terminals is disposed on a back surface of the semiconductor substrate. Each of the conductive terminals is electrically connected to a pad electrode on the front surface of the semiconductor substrate through a wiring layer. The wiring layer and the conductive terminal are formed on the back surface of the semiconductor substrate except in a region overlapping the light receiving element in a vertical direction, and are not disposed in a region overlapping the light receiving element.
申请公布号 SG133536(A1) 申请公布日期 2007.07.30
申请号 SG20060087340 申请日期 2006.12.15
申请人 SANYO ELECTRIC CO., LTD 发明人 NOMA TAKASHI;OKADA KAZUO;ISHIBE SHINZO;KITAGAWA KATSUHIKO;MORITA YUICHI;OTSUKA SHIGEKI;YAMADA HIROSHI;OKUBO NOBORU;SHINOGI HIROYUKI;OKIGAWA MITSURU
分类号 主分类号
代理机构 代理人
主权项
地址