发明名称 |
APPARATUS AND SYSTEM FOR CLEANING A SUBSTRATE |
摘要 |
<p>An apparatus for cleaning a substrate is disclosed. The apparatus having a first head unit and a second head unit. The first head unit is positioned proximate to the surface of the substrate and has a first row of channels defined within configured to supply a foam to the surface of the substrate. The second head unit is positioned substantially adjacent to the first head unit and proximate to the surface of the substrate. A second and a third row of channels are defined within the second head unit. The second row of channels is configured to supply a fluid to the surface of the substrate. The third row of channels is configured to apply a vacuum to the surface of the substrate.</p> |
申请公布号 |
SG133543(A1) |
申请公布日期 |
2007.07.30 |
申请号 |
SG20060087423 |
申请日期 |
2006.12.15 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
FREER ERIK M.;LARIOS JOHN M. DE;MIKHAYLICHENKO KATRINA;RAVKIN MICHAEL;KOROLIK MIKHAIL;REDEKER FRED C.;THOMAS CLINT;PARKS JOHN |
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