LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要
<p>Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing a pivotable mirror configured to move a patterned radiation beam incident on the substrate in substantial synchronism with the substrate.</p>
申请公布号
SG133510(A1)
申请公布日期
2007.07.30
申请号
SG20060085013
申请日期
2006.12.06
申请人
ASML NETHERLANDS B.V.;ASML HOLDING N.V.
发明人
VISSER, HUIBERT;CALLAN, DAVID WILLIAM;MUNNIG SCHMIDT, ROBERT- HAN;WIENER, ROBERTO B.;VAN DE VEN, JOHANNES THEODORUS GUILLIELMUS MARIA;ROBBINS, GEORGE HOWARD
