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发明名称
Method for forming shallow junction of semiconductor device
摘要
申请公布号
KR100743620(B1)
申请公布日期
2007.07.27
申请号
KR20010033865
申请日期
2001.06.15
申请人
发明人
分类号
H01L29/78
主分类号
H01L29/78
代理机构
代理人
主权项
地址
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