| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition for liquid immersion exposure, which has superior immersion medium resistance and lithography characteristics, at the same time, and to provide a method for forming a resist pattern. <P>SOLUTION: The resist composition for liquid immersion exposure contains a resin component(A), whose alkali solubility is varied by the action of an acid and an acid generator component (B) which generates acid, when it is exposed to light. The resin component (A)contains a resin (A1), containing a fluorine atom and another resin (A2), having a constitutional unit (a') derived from an acrylic acid and containing no fluorine atom. The amount of the resin (A1) contained in the resin component (A) is within the range of 0.1-50 mass%. <P>COPYRIGHT: (C)2007,JPO&INPIT |
