发明名称 PATTERN AREA VALUE CALCULATING METHOD, PROXIMITY EFFECT CORRECTING METHOD, AND CHARGED PARTICLE BEAM WRITING METHOD AND APPARATUS
摘要 A method for calculating area values of a pattern written by using a charged particle beam, includes virtually dividing a pattern into a plurality of mesh-like first square regions surrounded by first grids defined at intervals of a predetermined size, virtually dividing the pattern into a plurality of mesh-like second square regions surrounded by second grids defined at intervals of the predetermined size, wherein the second grids being positionally deviated from the first grids by a half of the predetermined size, distributing an area value of a sub-pattern in each of the second square regions to a plurality of apexes of each of the second square regions such that a center-of-gravity position of the sub-pattern does not change, wherein the sub-pattern being a part of the pattern, and outputting the distributed area values as area values, for correcting a proximity effect, defined at the center position of each of the first square regions.
申请公布号 US2007170374(A1) 申请公布日期 2007.07.26
申请号 US20070619383 申请日期 2007.01.03
申请人 NUFLARE TECHNOLOGY, INC. 发明人 IIJIMA TOMOHIRO;ISE MASAFUMI
分类号 A61N5/00;H01L21/027 主分类号 A61N5/00
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