发明名称 MANUFACTURING METHOD OF ELECTRO-OPTICAL DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an EL display device with high operation property reliability. SOLUTION: A plurality of TFTs are formed on a substrate, and a carbon film including at least a diamond thin film or an amorphous carbon film is formed on the plurality of FETs. A flattened film is formed on the carbon film and a contact hole is formed on the carbon film and the flattened film. A plurality of pixel electrodes connected to the plurality of TFTs respectively are formed through the contact hole, and an EL layer is selectively formed on the plurality of pixel electrodes by ink-jet method. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007188890(A) 申请公布日期 2007.07.26
申请号 JP20070016072 申请日期 2007.01.26
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 YAMAZAKI SHUNPEI;KOYAMA JUN;YAMAMOTO ICHIU;KONUMA TOSHIMITSU
分类号 H05B33/10;G09F9/30;H01L27/32;H01L51/50;H05B33/14 主分类号 H05B33/10
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