| 摘要 |
A main object of the present invention is to provide a method for manufacturing an EL element which can avoid a state which plural unnecessary layers are laminated on each pattern-formed light-emitting portion when the light-emitting portions are formed by photolithography and thus enables quick and easy peeling treatment in the peeling process of the unnecessary layers. In order to achieve the aforementioned objection, the present invention provides a method for manufacturing an electroluminescent element by photolithography, comprising: a process of providing a light-emitting portion of at least one color, having a photoresist layer on a surface thereof, on a substrate; a process of forming a heterochromatic light-emitting layer by coating the substrate with a heterochromatic light-emitting layer forming coating solution which expresses a different color from the color of the above light-emitting portion; a process of forming a photoresist layer for the heterochromatic light-emitting layer by coating the heterochromatic light-emitting layer with a photoresist; a process for pattern-exposing and developing the photoresist layer for the heterochromatic light-emitting layer, such that portions of the photoresist layer for the heterochromatic light-emitting layer which the heterochromatic light-emitting portion is to be formed, are remained; and a process of forming the heterochromatic light-emitting portion, having the photoresist layer for the heterochromatic light-emitting layer on the surface thereof, in a pattern by removing portions of the heterochromatic light-emitting layer which the photoresist layer for the heterochromatic light-emitting layer is removed.
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