| 摘要 |
An osseo-integrated dental implant comprising a polished band and a protuberance is disclosed. The polished band is located between a one-third and a two-third position of an overall length of a root of the implant as measured from an upper end of the root and polished in a circumferential direction to have a surface roughness of below 0.5 mum. A width of the polished band is 0.5 mm to 1.0 mm when the overall length of the root is below 8 mm, and 0.5 mm to 1.2 mm when the overall length of the root is between 9 mm and 12 mm, and 0.5 mm to 1.5 mm when the overall length of the root is above 13 mm. An external diameter of the polished band is smaller than an external diameter of a ridge of screw located at the upper portion of the root. A protuberance has a roughness same as the polished band, protruded from the polished band with a shape of a ridge of screw.
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