PLASMA PROCESSING APPARATUS

摘要

Disclosed is a plasma processing apparatus wherein a processing is carried out by using a plasma of a process gas generated by a microwave. Specifically disclosed is a plasma processing apparatus comprising a stage (34) on which an object (W) to be processed is placed, and a vacuum processing chamber (24) housing the stage. The processing chamber (24) has a cylindrical side wall (24A) and defines a processing space (S) for forming a plasma of a process gas over the stage. A microwave introducing window (76) is so formed in the side wall (24A) of the processing chamber in such a manner that the window surrounds the processing space. A microwave introducing device (80) is so arranged as to surround the side wall (24A) of the processing chamber. The microwave introducing device (80) introduces a microwave generated by a generator (84) into generally the center of the processing space (S) through the microwave introducing window (76).