发明名称 |
SHAPE ROUGHNESS MEASUREMENT IN OPTICAL METROLOGY |
摘要 |
A simulated diffraction signal to be used in measuring shape roughness of a structure formed on a wafer using optical metrology is generated by defining an initial model of the structure. A statistical function of shape roughness is defined. A statistical perturbation is derived based on the statistical function and superimposed on the initial model of the structure to define a modified model of the structure. A simulated diffraction signal is generated based on the modified model of the structure. |
申请公布号 |
WO2005119170(A3) |
申请公布日期 |
2007.07.26 |
申请号 |
WO2005US16872 |
申请日期 |
2005.05.12 |
申请人 |
TOKYO ELECTRON LIMITED;BISCHOFF, JOERG;NUI, XINHUI |
发明人 |
BISCHOFF, JOERG;NUI, XINHUI |
分类号 |
G06G7/48;G01B11/14;G01B11/24;G01B11/30 |
主分类号 |
G06G7/48 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|