| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a negative resist material having a very high curing rate and very excellent adhesion to a substrate, and an image pattern forming method using the same. <P>SOLUTION: The polymerizable composition comprises a photo-radical polymerization initiator (A) represented by formula (1), a radically polymerizable compound (B) and an alkali-soluble resin (C), wherein R<SP>1</SP>-R<SP>5</SP>each independently represent H or a monovalent organic residue, at least one of R<SP>1</SP>-R<SP>5</SP>is an alkoxy group which may have a substituent or an aryloxy group which may have a substituent, adjacent substituents of R<SP>1</SP>-R<SP>5</SP>may unite to form a mutually bonded cyclic structure; R<SP>6</SP>represents a monovalent organic residue; and R<SP>7</SP>represents an alkyl group which may have a ≥3C substituent. <P>COPYRIGHT: (C)2007,JPO&INPIT |
