| 摘要 |
<p>The subject of the invention is a device for depositing a polysilicon-based layer on an elongate and substantially flat, moving support, comprising a crucible containing a bath of molten silicon, a support having two longitudinal faces and two longitudinal lateral edges, said support being at least partially immersed in the bath and passing, substantially vertically in the length direction, through the equilibrium surface of the bath, and a heat shield substantially shrouding the crucible but having an opening through which said support, covered with a polysilicon-based layer, is extracted, said device furthermore including a member for driving the heat shield, intended to move said shield along an axis of displacement substantially perpendicular to a longitudinal face of said support so as to control the heat exchange between the inside and the outside of the crucible.</p> |
