PROCESS FOR PRODUCING SILICEOUS FILM AND SUBSTRATE WITH SILICEOUS FILM PRODUCED THEREBY

摘要

A process for producing a siliceous film with quality uniform irrespective of locality or groove interior or exterior wherein in the groove interior there is no void or crack. This substrate with siliceous film can be produced by first forming an insulating film of high hydrogen content on the surface of an uneven silicon substrate, subsequently coating the substrate with a composition containing a polysilazane compound and thereafter heating the coating product to thereby convert the polysilazane compound into a silicon dioxide film.