| 摘要 |
PROBLEM TO BE SOLVED: To provide technique in which profilograph can be performed at a high speed by performing variable continuation of an optical path length and solving the response delay of a measuring system. SOLUTION: A beam splitter 5 receives wide band light, branches entrance of a reference mirror to a reference optical path and a measurement path which has arranged an objected to be measured and irradiates it, while synthesizing a reflecting light from a reference mirror and the reflecting light from each irradiation position of an irradiation scope by which the object to be measured is irradiated is carried out, and outputs it. A piezo 8 carries out adjustable continuation of the optical path length of the measurement path, a camera 10 acquires data of interference pattern at a prescribed time spacing according to adjustability of this optical path length by the piezo 8 by picturizing the output from a beam splitter 5. An optical path length detecting means 14 expresses as a specific optical path length of each irradiation position based on time for interference pattern to arise based on data from the camera 10. A displacement operating means 15 is constituted to ask for relative displacement of each irradiation position on the basis of a difference of the specific optical path length of one irradiation position and other specific optical path lengths to be output by the optical path detecting means 14. COPYRIGHT: (C)2007,JPO&INPIT
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