发明名称 SYSTEM AND METHOD FOR ABSORBANCE MODULATION LITHOGRAPHY
摘要 A lithography system is disclosed that provides an array of areas of imaging electromagnetic energy that are directed toward a recording medium. The reversible contrast-enhancement material is disposed between the recording medium and the array of areas of imaging electromagnetic energy.
申请公布号 WO2007084279(A1) 申请公布日期 2007.07.26
申请号 WO2007US00457 申请日期 2007.01.05
申请人 MASSACHUSETTS INSTITUTE OF TECHNOLOGY;MENON, RAJESH;SMITH, HENRY, I. 发明人 MENON, RAJESH;SMITH, HENRY, I.
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
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