| 摘要 |
PROBLEM TO BE SOLVED: To provide a pot structure where stable vapor deposition can be continued by a simple constitution, and maintenance after the completion of the vapor deposition can be easily performed, and to provide a vapor deposition method. SOLUTION: The vapor deposition pot is equipped with: an evaporation chamber formed of the part to be packed with a material and an orifice plate for controlling the vapor pressure of the material by evaporation; and a pressure-controlling chamber formed in a space between the orifice plate and a discharge plate of discharging the evaporated material to the outside of the vapor deposition pot. The second opening part is formed at the upper edge in a projection projecting to the outside of the pressure-controlling chamber above the discharge plate; heaters are confronted at the side faces of the projection part, and a thermal insulation mechanism can be provided at the upper part of the heaters and also at a position lower than the second opening part. Further, the vapor deposition pot is provided with heaters for the evaporation chamber and heaters for the pressure-controlling chamber in which temperature can be set mutually independently so as to hold the temperature of the pressure-controlling chamber to the one higher than that of the evaporation chamber. COPYRIGHT: (C)2007,JPO&INPIT
|
