| 摘要 |
PROBLEM TO BE SOLVED: To provide a film-forming method which can efficiently form a film on many substrates by using a gas-flow sputtering technique, and to provide an apparatus therefor. SOLUTION: This film-forming method comprises the steps of: attaching the substrate (for instance, an optical lens and a transparent substrate for a display unit) to be film-formed by sputtering on the outer surface of a drum 2; reducing a pressure inside a chamber 1 to a predetermined vacuum degree; and operating a film-forming section 4 while rotating the drum 2. Thereby, a thin film is formed on the surface of the substrate by the gas-flow sputtering technique. COPYRIGHT: (C)2007,JPO&INPIT
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