| 摘要 |
Aspects of the invention include plasma generating devices and systems thereof, as well as methods of using the same in plasma generation. Embodiments of the plasma generating devices include a resonator having a discharge gap and a ground plane disposed on opposing sides of a substrate; and a gas flow element configured to flow gas through the discharge gap. In using the plasma generating devices, a gas is flowed through the discharge gap and sufficient power is applied to the resonator to produce a plasma, e.g., in the form of a plasma jet, at the discharge gap. The subject devices and methods find use in a variety of different applications.
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