SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD

摘要

Provided are a substrate treating apparatus and a substrate treating method, by which generation of stripe-like particles on a substrate surface can be suppressed or prevented by surely removing rinse solution from the substrate surface. The substrate treating apparatus is provided with a substrate inclining mechanism for inclining the substrate on a substrate holding mechanism which holds the substrate. After forming a liquid mass on the substrate by supplying the rinse solution, the substrate is inclined at a fine angle by the substrate inclining mechanism. The liquid mass moves downward without splitting, and drops on the upper surface of the substrate without leaving a fine droplet. Then, the substrate is returned to horizontal posture and the substrate is dried.