| 摘要 |
PROBLEM TO BE SOLVED: To provide a metallic pattern forming material which is capable of being developed by, at least, either pure water having a pH less than 7 or a water-soluble organic solvent having a boiling point of 100°C to 200°C, has good coating properties, and is capable of keeping a pattern good in shape; and to provide a method of forming a metallic pattern which has a high capacity for chemisorbing metal, and is capable of keeping its pattern good in shape. SOLUTION: The metallic pattern forming material contains a matrix polymer, a crosslinking monomer, and a photopolymerization initiator; and the matrix polymer contains a copolymer of an acrylic acid and an itaconic acid. COPYRIGHT: (C)2007,JPO&INPIT
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