| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for facilitating verification of remaining difference of compensation of deflected aberrations, and also for obtaining a compensation voltage of more adequate deflected aberrations, and to provide a drawing method. SOLUTION: An embodiment of the method for computing a deflected aberration-compensating voltage, comprises the steps of drawing (S104) the predetermined pattern at multiple focusing height positions, measuring (S106) the amount of variation in the size of the predetermined pattern, computing (S110) effective resolution by using the amount of variation in size, and computing (S304) the deflected aberration-compensating voltage of electron beam, on the basis of the focusing height position resulting in minimum effective resolution. Accordingly a more adequate deviated aberration-compensating voltage can be obtained. COPYRIGHT: (C)2007,JPO&INPIT
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