发明名称 MUSTERUNGSMETHODE
摘要 A patterning method comprises selectively depositing droplets of a first material solvent solution onto a layer of a second material. The solvent is chosen to dissolve both materials, which are selected so as to exhibit phase separation upon the removal of the solution to provide domains of the first material embedded in and extending through the second material. By selection of appropriate materials the patterning method may be used, for example, to fabricate light emitting devices, optical color filters, or vertical interconnects in electronic devices.
申请公布号 DE60220654(D1) 申请公布日期 2007.07.26
申请号 DE2002620654 申请日期 2002.03.28
申请人 SEIKO EPSON CORP.;CAMBRIDGE UNIVERSITY TECHNICAL SERVICES LTD. 发明人 KAWASE, TAKEO
分类号 H01L51/40;H05B33/10;G09F9/00;G09F9/30;H01L27/32;H01L51/00;H01L51/05;H01L51/30;H01L51/50;H05B33/02;H05B33/12;H05B33/22;H05B33/26 主分类号 H01L51/40
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