| 摘要 |
A photosensitive polymer for a photoresist and a photoresist composition having the same are provided. The photosensitive polymer for a photoresist includes the repeating unit represented by the formula below: wherein R<SUB>1 </SUB>is a C<SUB>1</SUB>-C<SUB>20 </SUB>hydrocarbon group or a C<SUB>1</SUB>-C<SUB>20 </SUB>hetero hydrocarbon group including at least one hetero atom selected from the group consisting of nitrogen, fluorine and sulfur.
|
