发明名称 A SUBSTRATE MANUFACTURING METHOD USING NANO PATTERNS
摘要 <p>A method for manufacturing a substrate using a nano pattern is provided to uniform characteristics between products made by the substrate by performing heat-treatment for the nano pattern formed on the substrate. A nano pattern(35) is deposited on one surface of a substrate(30), and then the nano pattern is subjected to heat-treatment to form single crystal. Then, an organic layer or inorganic layer is adhered on the single crystal. The nano pattern has a size of 10 to 900 nanometers and a cylindrical shape. The step of depositing the nano pattern includes a step of etching the substrate to form a well of nano size and a step of positioning the nano pattern in the well.</p>
申请公布号 KR100745167(B1) 申请公布日期 2007.07.26
申请号 KR20060013370 申请日期 2006.02.13
申请人 KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE 发明人 KOO, JA YONG
分类号 H01L21/20;H01L21/027 主分类号 H01L21/20
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