| 摘要 |
An apparatus and method for depositing a thin film is provided to form a planar thin film by quickly forming a thin film using plasma and compensating uneven portions of the thin film using a ramping down deposition process. A thin film deposition process is performed in a vertical tube(110), and a plasma generator(160) is disposed in the vertical tube to generate plasma. A heater(130) is disposed adjacent to the vertical tube to apply heat to the vertical tube. A boat(122) is rotatably disposed in the vertical tube, and plural sheets of wafers(W) are mounted on the boat. The plasma generator has a first electrode rod, a second electrode rod for a power required for producing the plasma, an injector having plural injection halls, and a power source applying the power to the second electrode rod.
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