| 摘要 |
A substrate cleaning/drying apparatus and its driving method are provided to prevent the generation of process failure in the following processes by detecting an abnormally supplied state of deionized water on a dried substrate or a spin chuck using a photo sensor. A substrate cleaning/drying apparatus includes a process cup(110) for performing cleaning and drying processes on a substrate, a spin chuck, a deionized water supply nozzle, and a photo sensor. The spin chuck(120) is installed in the process cup to load the substrate. The deionized water supply nozzle(130) is used for supplying deionized water into the process cup. The photo sensor(140) is installed at a periphery of the process cup to detect the deionized water supplied from the deionized water supply nozzle from the spin chuck.
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