发明名称 Method and device for controlling a matrix plasma screen
摘要 <p>The method involves sequentially selecting lines of a matrix, and transmitting a state changing control signal (INj) towards each column of a set of columns by a MOS transistor (T2) for passing each column from one state to another state. The signal has a transitional state from low to high. Electrodes of a control transistor (TC) are coupled to a supply terminal and deliver a control voltage to an electrode of the transistor (T2) in order to limit a value of current traversing the transistor (T2) during the transitional state for regulating a rise time of the signal. Independent claims are also included for the following: (1) a device for controlling a matrix plasma screen (2) a plasma screen comprising a control device.</p>
申请公布号 EP1811491(A1) 申请公布日期 2007.07.25
申请号 EP20070290067 申请日期 2007.01.18
申请人 STMICROELECTRONICS SA 发明人 BEZAL, JEAN-RAPHAEL;PERMEZEL, JEAN-MARIE;TROUSSEL, GILLES
分类号 G09G3/28;G09G3/288;G09G3/293;G09G3/296 主分类号 G09G3/28
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