| 摘要 |
A lithographic apparatus is provided to project a pattern from a patterning device into a substrate using a projection system and to eliminate a liquid from the vicinity of the substrate. A liquid supply system is arranged to supply a liquid to a space between a projection system(PL) and a substrate(W). A conduit has an open end adjacent a volume in which liquid is present. A porous member is interposed between the end of the conduit and the volume. A suction device is arranged to create a pressure differential across the porous member. The volume is adjacent a space comprising the liquid through which the patterned beam is projected. |
