| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an emission spectrophotometer capable of reducing the cost for purge processing by shortening the gas purge processing time, and having improved detection accuracy. <P>SOLUTION: This ICP (inductively coupled plasma) emission spectrophotometer has a light emitting part 1 for emitting light in plasma flame from a measuring component element included in a measuring object sample, and a detection part 8 for detecting emission spectrum intensity, and performs quantitative analysis of the measuring component element by using the emission spectrum intensity. The spectrophotometer is provided with an input line 22 for allowing purge gas to flow into the detection part 8, and an output line 24 for allowing the purge gas flowing into the detection part 8 to flow out, and is constituted so that the purge gas is allowed to flow into the detection part 8 through the input line 22 and then to flow out from the output line 24, and that the gas flowing out is guided to the light emitting part 1. By this constitution, when the input line and the output line are opened, the purge gas is allowed to flow into the detection part through the input line, and the detection part is purged by the gas, and if the gas pressure exceeds, for example, a room temperature atmospheric pressure, the gas is allowed to flow out from the input line, and thereby the purge gas always flows in the detection part, and deterioration of the purge gas in the detection part is reduced. Hereby, the detection performance is stabilized, and the detection accuracy of the emission spectrum from the light emitting part is heightened. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
