发明名称 APPARATUS FOR MEASURING THICKNESS OF A LAYER
摘要 A device for measuring a film thickness is provided to improve the reliability of obtained data by using a light emitting diode having broadband wavelength as a light source. A light source(120) has a light emitting diode for irradiating light onto a semiconductor substrate at a predetermined angle. The light emitted from the light source is polarized by a polarizer(130). A detection part(160) detects the light reflected from the substrate, and verifies the polarized state of the reflected light. A computing part(170) computes a thickness of a film formed on the substrate based on the polarized state.
申请公布号 KR20070076276(A) 申请公布日期 2007.07.24
申请号 KR20060005447 申请日期 2006.01.18
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, YOUNG SOON
分类号 H01L21/66 主分类号 H01L21/66
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