发明名称 Lithographic apparatus and device manufacturing method
摘要 A lithographic apparatus is presented in which vibrations induced by reaction forces exerted on a base frame BF by accelerations within the apparatus are eliminated without the need for complex positioning systems and several balance masses. This is achieved by using feed-forward control to apply a compensating force using actuators to the base frame, based on knowledge of the movements and accelerations of the substrate table and other parts within the apparatus.
申请公布号 US7248339(B2) 申请公布日期 2007.07.24
申请号 US20040880606 申请日期 2004.07.01
申请人 ASML NETHERLANDS B.V. 发明人 VAN SCHOTHORST GERARD;VAN EIJK JAN;LOOPSTRA ERIK ROELOF;MUNNIG SCHMIDT ROBERT-HAN;PEETERS FELIX GODFRIED PETER
分类号 F16F15/02;G03B27/58;G03B27/42;G03F7/20;H01L21/027 主分类号 F16F15/02
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