发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A lithographic apparatus is presented in which vibrations induced by reaction forces exerted on a base frame BF by accelerations within the apparatus are eliminated without the need for complex positioning systems and several balance masses. This is achieved by using feed-forward control to apply a compensating force using actuators to the base frame, based on knowledge of the movements and accelerations of the substrate table and other parts within the apparatus.
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申请公布号 |
US7248339(B2) |
申请公布日期 |
2007.07.24 |
申请号 |
US20040880606 |
申请日期 |
2004.07.01 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN SCHOTHORST GERARD;VAN EIJK JAN;LOOPSTRA ERIK ROELOF;MUNNIG SCHMIDT ROBERT-HAN;PEETERS FELIX GODFRIED PETER |
分类号 |
F16F15/02;G03B27/58;G03B27/42;G03F7/20;H01L21/027 |
主分类号 |
F16F15/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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