| 摘要 |
An apparatus for forming a pattern has a light-modulating unit, a scanner, a pattern data processor, a light modulating controller, a position-error detector, and a correction value calculator. The pattern data processor generates band-pattern data corresponding to each scanning band on the basis of pattern data matching a preceding pattern that is repeatedly and regularly formed on the photo-sensitive material. The position-error detector detects a position-error of the preceding pattern relative to a pattern area. The correction value calculator calculates an alignment correction value in each pattern area on the basis of the position-error, so as to overlay the pattern on the preceding pattern. The pattern data processor corrects the band-pattern data in accordance with the alignment correction value while classifying each exposure data of the band-pattern data into a corresponding pattern area.
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